Kinetic Studies in GeO2/Ge System By Sheng-Kai Wang 9781032258485

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Electronic devices & materials

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Wordery

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Crc press

Kinetic Studies in GeO2/Ge System : CRC Press : 9781032258485 : 1032258489 : 26 Aug 2024 : Kinetic Studies in GeO2/Ge System: A Retrospective from 2021 investigates reaction kinetics in GeO2/Ge systems, aiming to demonstrate the fundamentals of the GeO2/Ge interface and to give insight into the distinctive features and performance of Ge (germanium) applied to advanced complementary metal oxide semiconductor (CMOS) devices.This book first reviews the development of MOS technology and discusses the potentials of emerging Ge and the challenges facing it as a contentious channel material, once promising to replace Si (silicon) for advanced nodes. The study systematically analyzes the following aspects of GeO2/Ge stacks that will shed light on the characteristics and reaction principles of the system: GeO2/Ge degradation, Ge passivation techniques, desorption kinetics of GeO from GeO2/Ge, the relationship between GeO2 crystallization and GeO2/Ge interface reaction, and the oxidation kinetic

45.99 GBP