Ion Implantation Range and Energy Deposition Distributions : Springer : 9781475756142 : 1475756143 : 22 Oct 2013 : The present level of understanding of ion implantation is sufficient that implantation Ls being used not only as a tool in various fields of research, but also as an industrial )rocess. In these applications one uses either the implanted ions, or their energy, to nodify some properties of the target substance, and is therefore concerned with the spatial listribution of the ions or of their energy. Following the pioneering work of Bohr [1), ~indhard and his collaborators have evolved a general description of the behaviour of swift Lons slowing down in amorphous targets [2,3,4), a description which has been the basis of nuch other work in the field. Various approximate calculations have been based on this :heory, but it has not always been clear whether any disagreement between experiment and :heory is real or can be attributed to deficiencies in calculation. It is the purpo